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Journals >
Optoelectronic Technology >
Volume 43 >
Issue 4 >
Page 351 > Article
Optoelectronic Technology
Vol. 43, Issue 4, 351 (2023)
Investigation and Research onThreshold Voltage in IGZO TFT Process
Hui ZHAO, Yanchang WANG, and Tao HUA
Author Affiliations
Nanjing BOE Display Technology Co.,Ltd., Nanjing 210033, CHN
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DOI:
10.19453/j.cnki.1005-488x.2023.04.013
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Hui ZHAO, Yanchang WANG, Tao HUA. Investigation and Research onThreshold Voltage in IGZO TFT Process[J]. Optoelectronic Technology, 2023, 43(4): 351
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Fig. 1.
V
TH
map
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Fig. 2.
Mask-glass position
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Fig. 3.
Mask-glass position
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Fig. 4.
Plasma distribution
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Fig. 5.
Schematic of optimized plasma distribution
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Fig. 6.
V
TH
fluctuation of different oxygen partial pressures
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Fig. 7.
Optimized
V
TH
map
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Abstract
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Figures&Tables (7)
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References (7)
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Hui ZHAO, Yanchang WANG, Tao HUA. Investigation and Research onThreshold Voltage in IGZO TFT Process[J]. Optoelectronic Technology, 2023, 43(4): 351
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Paper Information
Category: 技术与测试
Received: Feb. 27, 2023
Accepted: --
Published Online: Dec. 30, 2023
The Author Email:
DOI:
10.19453/j.cnki.1005-488x.2023.04.013
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