• Infrared and Laser Engineering
  • Vol. 49, Issue 3, 303012 (2020)
Lei Huang, Tianyi Wang, and Mourad Idir
Author Affiliations
  • NSLS-II, Brookhaven National Laboratory, Upton, NY 11973, USA
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    DOI: 10.3788/IRLA202049.0303012 Cite this Article
    Lei Huang, Tianyi Wang, Mourad Idir. Study on stitching interferometry for synchrotron mirror metrology[J]. Infrared and Laser Engineering, 2020, 49(3): 303012 Copy Citation Text show less
    The essential purpose of stitching is to determine the geometric relation for the subset data
    Fig. 1. The essential purpose of stitching is to determine the geometric relation for the subset data
    Photos of the hardware and the software interface in the NSLS-II stitching platform
    Fig. 2. Photos of the hardware and the software interface in the NSLS-II stitching platform
    Photos of the X-ray flat mirror. To check the self-consistency of a measurement system, the SUT is usually tested in (a) A-to-B orientation and (b) B-to-Aorientation (SUT rotated 180° along its surface normal)
    Fig. 3. Photos of the X-ray flat mirror. To check the self-consistency of a measurement system, the SUT is usually tested in (a) A-to-B orientation and (b) B-to-Aorientation (SUT rotated 180° along its surface normal)
    Different sub-apertures (highlighted in a yellow rectangle) with (a) 600 pixel×150 pixel and (b) 256 pixel×64 pixel are used to measure this X-ray flat mirror in software stitching mode for comparison
    Fig. 4. Different sub-apertures (highlighted in a yellow rectangle) with (a) 600 pixel×150 pixel and (b) 256 pixel×64 pixel are used to measure this X-ray flat mirror in software stitching mode for comparison
    30 repeated scans on the X-ray flat mirror show excellent stitching repeatability
    Fig. 5. 30 repeated scans on the X-ray flat mirror show excellent stitching repeatability
    Measurement discrepancies of the central line (a) are at sub-nanometer level, and most of the discrepancies have an RMS value less than 0.15 nm (b)
    Fig. 6. Measurement discrepancies of the central line (a) are at sub-nanometer level, and most of the discrepancies have an RMS value less than 0.15 nm (b)
    Similar results are obtained by different stitching interferometers at ESRF and NSLS-II using different sub-apertures in different mirror orientations on different dates
    Fig. 7. Similar results are obtained by different stitching interferometers at ESRF and NSLS-II using different sub-apertures in different mirror orientations on different dates
    x-slope values along the 2.5-mm-wide center line are calculated from the stitched data and compared with the NSLS-II NSP data. Some curves are vertically shifted for clarity
    Fig. 8. x-slope values along the 2.5-mm-wide center line are calculated from the stitched data and compared with the NSLS-II NSP data. Some curves are vertically shifted for clarity
    Photo of the measured X-ray hyperbolic cylindrical mirror
    Fig. 9. Photo of the measured X-ray hyperbolic cylindrical mirror
    Stitched height maps of the X-ray hyperbolic cylindrical mirror surface (a) and the shape errors after removing the target shape (b)
    Fig. 10. Stitched height maps of the X-ray hyperbolic cylindrical mirror surface (a) and the shape errors after removing the target shape (b)
    Lei Huang, Tianyi Wang, Mourad Idir. Study on stitching interferometry for synchrotron mirror metrology[J]. Infrared and Laser Engineering, 2020, 49(3): 303012
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