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    Journals >Chinese Journal of Lasers >Volume 40 >Issue 2 >Page 216001 > Article
    • Chinese Journal of Lasers
    • Vol. 40, Issue 2, 216001 (2013)
    Design of Micro-Cylindrical-Lens Array Used for Illumination Uniformization in Lithography Systems
    Xiao Yanfen1、*, Zhu Jing1, Yang Baoxi1, Hu Zhonghua1、2, Zeng Aijun1, and Huang Huijie1
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    DOI: 10.3788/cjl201340.0216001 Cite this Article Set citation alerts
    Xiao Yanfen, Zhu Jing, Yang Baoxi, Hu Zhonghua, Zeng Aijun, Huang Huijie. Design of Micro-Cylindrical-Lens Array Used for Illumination Uniformization in Lithography Systems[J]. Chinese Journal of Lasers, 2013, 40(2): 216001 Copy Citation Text show less
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    Xiao Yanfen, Zhu Jing, Yang Baoxi, Hu Zhonghua, Zeng Aijun, Huang Huijie. Design of Micro-Cylindrical-Lens Array Used for Illumination Uniformization in Lithography Systems[J]. Chinese Journal of Lasers, 2013, 40(2): 216001
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