• Opto-Electronic Engineering
  • Vol. 31, Issue 1, 5 (2004)
[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]
Author Affiliations
  • [in Chinese]
  • show less
    DOI: Cite this Article
    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Design and construction of an ultrahigh vacuum evaporation equipment for atom photolithography[J]. Opto-Electronic Engineering, 2004, 31(1): 5 Copy Citation Text show less
    References

    [1] VON BUNAU R,OWEN G,PEASE R F W.Depth of focus enhancement in optical lithography [J]. J. Vac. Sci. Technol, 1991, 10B(6):3047-3054.

    [2] MCCELLAND J J,ANDERSON W R,CELOTTA R J.Nanofabrication via Atom Optics with Chromium [J]. SPIE, 1997, 2995: 90-95.

    [3] MCCELLAND J J,SCHOLTEN R E,PALM E C,et al.Laser focused atomic deposition [J]. Science, 1993, 262(5153):877-880.

    [4] REHSE S J,MCGOWAN R W,LEE S A. Optical manipulation of group III atoms [J]. Appl. Phys,2000, 70B(7):657-660.

    [5] LEE C J. Quantum-mechanical analysis of atom lithography [J]. Phys. Rev,2000, 61A(6):063604-1-063604-9.

    [6] CELOTTA R J,GUPTA R,SCHOLTEN R E,et al. Nanostructure fabrication via laser-focused atomic deposition(invited) [J]. J. Appl. Phys,1996, 79(8):6079-6083.

    [7] HUO Yun-sheng,CAI Wei-quan, ZENG Qing-lin et al. Study on metastable neon source used for atom lithography[J]. Chinese Journal of lasers, 2002, 29A(1):40-43 (in Chinese).

    [8] PAN Shao-hua.New mechanism of laser cooling [J]. Physics, 1992, 21(2):81-84 ( in Chinese).

    CLP Journals

    [1] Li Shiwei, Zhang Jilong, Wang Zhibin, Tian Erming. Detecting and Warning System Design of Laser Attacking Direction[J]. Laser & Optoelectronics Progress, 2011, 48(6): 60403

    [2] Zhang Weian, Wang Long, Ren Jianguo. Research on Laser Threat Source Localization of Omni-Directional Laser Warning System Based on Scattering Laser Detection[J]. Acta Optica Sinica, 2012, 32(1): 115004

    [3] Wu Wuming, Ni Yu, Ren Yajie, Wu Yi, Shu Baihong. Research Progress of Scintillations for Laser Array Beams in Atmospheric Turbulence[J]. Laser & Optoelectronics Progress, 2012, 49(7): 70008

    [4] Xu Ancheng, Chen Jiabi, Zhang Peiming. Error Analysis of Ocular Aberration Measurement Instrument Based on Hartmann-Shack Wavefront Sensor[J]. Laser & Optoelectronics Progress, 2010, 47(8): 82801

    [5] Yang Jinsheng, Rao Xuejun, Rao Changhui. A Corneal Topography Based on Hartmann-Shack Sensor[J]. Chinese Journal of Lasers, 2010, 37(3): 826

    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Design and construction of an ultrahigh vacuum evaporation equipment for atom photolithography[J]. Opto-Electronic Engineering, 2004, 31(1): 5
    Download Citation