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    Journals >Acta Photonica Sinica >Volume 32 >Issue 1 >Page 65 > Article
    • Acta Photonica Sinica
    • Vol. 32, Issue 1, 65 (2003)
    The Study of Optimizing Parameters in Preparing VO2 Films by Magnetron Sputtered Method
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. The Study of Optimizing Parameters in Preparing VO2 Films by Magnetron Sputtered Method[J]. Acta Photonica Sinica, 2003, 32(1): 65 Copy Citation Text show less

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. The Study of Optimizing Parameters in Preparing VO2 Films by Magnetron Sputtered Method[J]. Acta Photonica Sinica, 2003, 32(1): 65
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