Growth conditions of Cu thin-films grown by CVD using kinetic Monte Carlo simulation

Peng LI; Zhenxiong YANG; Hu ZHAO

doi:10.3969/j.issn.1007-5461.2015.03.017

[1] Zhang Z Y, Lagally M G. Atomistic processes in the early stages of thin-film growth ［J］. Science, 1997, 27(1): 377-383.

[2] Lü kermann D, Banyoudeh S, et al. Growth of epitaxial Bi-films on vicinal Si(111) ［J］. Surface Science, 2014, 62(1): 82-87.

[3] Haberland H, Insepov Z, et al. Molecular-dynamics simulation of thin-film growth by energetic cluster impact ［J］. Phys. Rev. B, 1995, 51(16): 11061-11067.

[4] Battaile C C, Srolovitz D J, et al. A kinetic Monte Carlo method for the atomic-scale simulation of chemical vapor deposition: Application to diamond ［J］. J. Appl. Phys., 1997, 82(12): 6293-6300.

[5] Liang Dong, Richard W S, et al. A two-dimensional molecular dynamics simulation of thin film growth ［J］. Appl. Phys., 1996, 80(10): 5682-5690.

[6] Chung C Y, Chung Y C. Molecular dynamics simulation of nano-scale Fe-Al thin film growth ［J］. Materials Letters, 2006, (0): 1063-1067.

[7] Kelchner C L, DePristo A E. Moleculer dynamics simulation of low energy cluster deposition during diffusion-limited thin film groeth ［J］. Nanostructured Materials, 1997, 8(3): 253-268.

[8] Nath P, Ranganathan M. Study of Stranski-Krastanov growth using kinetic Monte Carlo simulations with an atomistic model of elasticity ［J］. Surface Science, 2014, 62(8): 8-16.

[9] Mae K. Molecular dynamics aided kinetic Monte Carlo simulations of thin film growth of Ag on Mo(1 1 0) with structural evolution ［J］. Surface Science, 2001, 48(5): 860-865.

[10] Pedersen D. Development of a kinetic Monte Carlo Code［OL］. http://uu.diva-portal.org/smash/get/diva2:632911/FULLTEXT01.pdf.

[11] Entropy, Wikipedia［OL］. URL:http://en.wikipedia.org/wiki/Entropy.

[12] Gleason K K, Wang K S,et al. Monte Carlo simulations of amorphous hydrogenated silicon thin-film growth ［J］. J. Appl. Phys., 1987, 61(8): 2866-2873.

[13] Liang Y Y, Yoon S F, et al. Kinetic Monte Carlo simulation of quantum dot growth on stepped substrates ［J］. J. Phys. D: Appl. Phys., 2013, 4(1): 1-5.

[15] Sun J Z, Liu S J, et al. Dynamic Monte Carlo simulation of film-substrate interface mixing in the deposition ［J］. Surface Science, 2011, 60(5): 1298-1303.

[16] Wang Z Y, Li Y H, et al. Kinetic lattice Monte Carlo simulation of facet growth rate ［J］. Surface Science, 2000, 45(1): 51-63.

[17] Kaukonen M O, Nieminen R M. Molecular-dynamics simulation of the growth of diamond-like films ［J］. Surface Science, 1995, 33(1): 975-977.

[18] Levanov N, Stepanyuk V S, et al. Molecular dynamics simulation of Co thin films growth on Cu(001) ［J］. Surface Science, 1998, 40(1): 54-62.

[19] Picone A, Riva M, et al. Enhanced atom mobility on the surface of a metastable film ［J］. Phys. Rev. Lett., 2014, 11(3): 0461021-0461025.

[21] Almeida R A, Ferreira S O, et al. Universal fluctuations in the growth of semiconductor thin films ［J］. Phys. Rev. B, 2014, 89(4): 0453091-0453595.

[22] Wang X W, Wang X, et al. Magnetic anisotropy and metal-insulator transition in SrRuO thin films at different growth temperatures ［J］. Journal of Applied Physics, 2010, 10(7): 1139251-1139255.

[23] Zhang P F, Zheng X P, et al. Kinetic Monte Carlo simulation of Cu thin film growth ［J］. Vacuum, 2004, 7(2): 405-410.

[25] Shim Y, Amar J G. Rigorous synchronous relaxation algorithm for parallel kinetic Monte Carlo simulations of thin film growth ［J］. Phys. Rev. B, 2005, 7(1): 1154361-11543612.

[26] Weinzierl S. Introduction to Monte Carlo methods ［OL］. URL: arxiv.org/pdf/hep-ph/0006269v1.pdf.

[27] Cuerno R, Castro M, et al. Universal non-equilibrium phenomena at submicrometric surfaces and interfaces ［J］. Eur. Phys. J. Special Topics, 2007, 14(6): 427-441.

[28] Kelchner C L, DeFristo A E. Molecular dynamics simulations of multilayer homoepitaxial thin film growth in the diffusion-limited regime ［J］. Nanostructured Materials, 1997, 39(3): 72-84.

[29] Antoshchenkova E, Hayoun M, et al. Kinetic Monte-Carlo simulation of the homoepitaxial growth of MgO{001} thin films by molecular deposition ［J］. Surface Science, 2012, 60(6): 605-614.