Double telecentricity configuration of optical projection lenses with alignment characteristic through optical axis and uniform illumination principle of optical system for microlithography are discribed. To meet requirements of optical transfer function (OTF)for i-line lithography, the relations between photolithographic resolution and numerical aperture (NA) are discussed. As an example, we designed a new double telecentricity projection lens with NA=0.42, magnification M=-1/5, field size 15 mm×15 mm (21.2 mm diametre) and conjugate distance 602 mm. Optical design program ZEMAX-XE is used to calculate image qualities of the i-line lens. The calculating results indicate that the wavefront aberration <λ/4 and MTF>0.55 across the entire field when spatial frequency is 715 pl/mm and using wavelength is 365士3 nm. That means the photolithographic resolution of 0.7 μm could be realized. The illumination uniformizer consists of an array of 81 small square lens elements. The illumination uniformity of 士2% could be realized by using our simulation program OPENG to calculated light intensity distribution on illuminated image plane.