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    Journals >Chinese Journal of Lasers >Volume 50 >Issue 6 >Page 0605003 > Article
    • Chinese Journal of Lasers
    • Vol. 50, Issue 6, 0605003 (2023)
    Lithography Illumination System Based on Fourier Synthesis Technology
    Hui Li, Xiaobin Wu*, Xiaoquan Han, He Ma, and Pengfei Sha
    Author Affiliations
  • R & D Center of Optoelectronic Technology, Institute of Microelectronics of the Chinese Academy of Sciences, Beijing 100029, China
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    DOI: 10.3788/CJL221221 Cite this Article Set citation alerts
    Hui Li, Xiaobin Wu, Xiaoquan Han, He Ma, Pengfei Sha. Lithography Illumination System Based on Fourier Synthesis Technology[J]. Chinese Journal of Lasers, 2023, 50(6): 0605003 Copy Citation Text show less
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    Article index updated: Jun. 1, 2024
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    Hui Li, Xiaobin Wu, Xiaoquan Han, He Ma, Pengfei Sha. Lithography Illumination System Based on Fourier Synthesis Technology[J]. Chinese Journal of Lasers, 2023, 50(6): 0605003
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    Paper Information
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