Uniform light design of digital lithography illumination system based on 365 nm LED

Qingjiu LIANG; Jinyun ZHOU

doi:10.3969/j.issn.1007-5461. 2018.02.015

Journals >Chinese Journal of Quantum Electronics >Volume 35 >Issue 2 >Page 225 > Article

Chinese Journal of Quantum Electronics
Vol. 35, Issue 2, 225 (2018)

Uniform light design of digital lithography illumination system based on 365 nm LED

Qingjiu LIANG^* and Jinyun ZHOU

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[in Chinese]

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DOI: 10.3969/j.issn.1007-5461. 2018.02.015 Cite this Article

LIANG Qingjiu, ZHOU Jinyun. Uniform light design of digital lithography illumination system based on 365 nm LED[J]. Chinese Journal of Quantum Electronics, 2018, 35(2): 225 Copy Citation Text

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References

[2] Seo M, Kim H, Park M. Maskless lithographic pattern generation system upon micromirrors[J]. Computer-Aided Design and Applications, 2006, 3(1/4): 185-192.

[3] Gao Y, Shen T, Chen J, et al. Research on high-quality projecting reduction lithography system based on digital mask technique[J]. Optik-International Journal for Light and Electron Optics, 2005, 11(7): 303-310.

[7] Blake G, Donald G, Joseph M, et al. A fly’s eye conderser system for uniform illumination[J]. OSA/IODC, 2002, 13(8): 130-131.

LIANG Qingjiu, ZHOU Jinyun. Uniform light design of digital lithography illumination system based on 365 nm LED[J]. Chinese Journal of Quantum Electronics, 2018, 35(2): 225

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