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    Journals >Acta Optica Sinica >Volume 29 >Issue 9 >Page 2520 > Article
    • Acta Optica Sinica
    • Vol. 29, Issue 9, 2520 (2009)
    Design of Extreme Ultraviolet Lithographic Objectives
    Yang Xiong* and Xing Tingwen
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  • [in Chinese]
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    DOI: 10.3788/aos20092909.2520 Cite this Article Set citation alerts
    Yang Xiong, Xing Tingwen. Design of Extreme Ultraviolet Lithographic Objectives[J]. Acta Optica Sinica, 2009, 29(9): 2520 Copy Citation Text show less
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    Article index updated: May. 18, 2024
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    Yang Xiong, Xing Tingwen. Design of Extreme Ultraviolet Lithographic Objectives[J]. Acta Optica Sinica, 2009, 29(9): 2520
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    Paper Information
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