• International Journal of Extreme Manufacturing
  • Vol. 3, Issue 3, 35201 (2021)
Bo Feng1, Yifang Chen1、*, Duo Sun2, Zongyao Yang1, Bo Yang2, Xue Li2, and Tao Li2
Author Affiliations
  • 1Nanolithography and Application Research Group, State Key Laboratory of ASIC and System, School of Information Science and Technology, Fudan University, Shanghai 200433, People’s Republic of China
  • 2State Key Laboratories of Transducer Technology, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, People’s Republic of China
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    DOI: 10.1088/2631-7990/abf5c8 Cite this Article
    Bo Feng, Yifang Chen, Duo Sun, Zongyao Yang, Bo Yang, Xue Li, Tao Li. Precision integration of grating-based polarizers onto focal plane arrays of near-infrared photovoltaic detectors for enhanced contrast polarimetric imaging[J]. International Journal of Extreme Manufacturing, 2021, 3(3): 35201 Copy Citation Text show less
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    Bo Feng, Yifang Chen, Duo Sun, Zongyao Yang, Bo Yang, Xue Li, Tao Li. Precision integration of grating-based polarizers onto focal plane arrays of near-infrared photovoltaic detectors for enhanced contrast polarimetric imaging[J]. International Journal of Extreme Manufacturing, 2021, 3(3): 35201
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