• Optoelectronics Letters
  • Vol. 11, Issue 5, 352 (2015)
Yu-zhu GAO1、*, Xiu-ying GONG1, Ran ZHOU1, Ji-jun LI2, Yan-bin FENG2, Makino Takamitsu3, and Kan Hirofumi3
Author Affiliations
  • 1College of Electronics and Information Engineering, Tongji University, Shanghai 201804, China
  • 2Huaxing Infrared Device Company, Xi’an 712099, China
  • 3Hamamatsu Photonics K. K., 5000 Hirakuchi, Hamakita 434-8601, Japan
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    DOI: 10.1007/s11801-015-5122-y Cite this Article
    GAO Yu-zhu, GONG Xiu-ying, ZHOU Ran, LI Ji-jun, FENG Yan-bin, Takamitsu Makino, Hirofumi Kan. Uncooled InAs0.09Sb0.91photoconductors with cutoff wavelength extended to 11.5 μm[J]. Optoelectronics Letters, 2015, 11(5): 352 Copy Citation Text show less

    Abstract

    Uncooled InAsSb photoconductors were fabricated. The photoconductors were based on InAs0.09Sb0.91and InAs0.09Sb0.91thick epilayers grown on InAs substrates by melt epitaxy (ME). Ge immersion lenses were set on the photoconductors. The cutoff wavelength of InAs0.09Sb0.91detectors is obviously extended to 11.5 μm, and that of InAs0.09Sb0.95detectors is 8.3 μm. At room temperature, the peak detectivity of Dλp* at wavelength of 6.8 μm and modulation frequency of 1 200 Hz is 1.08×109cm·Hz1/2·W-1 for InAs0.09Sb0.91photoconductors, the detectivity D* at wavelength of 9 μm is 7.56×108cm·Hz1/2·W-1, and that at 11 μm is 3.92×108cm·Hz1/2·W-1. The detectivity of InAs0.09Sb0.91detectors at the wavelengths longer than 9 μm is about one order of magnitude higher than that of InAs0.09Sb0.95detectors, which rises from the increase of arsenic (As) composition in InAs0.09Sb0.91materials.
    GAO Yu-zhu, GONG Xiu-ying, ZHOU Ran, LI Ji-jun, FENG Yan-bin, Takamitsu Makino, Hirofumi Kan. Uncooled InAs0.09Sb0.91photoconductors with cutoff wavelength extended to 11.5 μm[J]. Optoelectronics Letters, 2015, 11(5): 352
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