Fig. 1. Numerical investigation of vectorial spin-orbital Hall effect of light upon tight focusing: (a) spatial frequency domain in Cartesian coordinates, (b–d) on- and off-axis propagation of a circularly polarized first-order optical vortex beam. The symmetry breaking in the longitudinal component and extrinsic OAM$L_z^{\text{ext}}$ are shown.

Fig. 2. Comparison of asymmetry in focusing a shifted vortex beam with m=±1 order for x-linear polarization.

Fig. 3. Comparison of asymmetry in focusing a shifted vortex beam with m=±2 order for x-linear polarization.

Fig. 4. Comparison of asymmetry in focusing a shifted vortex beam withm=±1 order fory-linear polarization.

Fig. 5. Comparison of asymmetry in focusing a shifted vortex beam withm=±2 order fory-linear polarization.

Fig. 6. Comparison of asymmetry in focusing a shifted vortex beam with m=+1 order for “±” -circular polarization.

Fig. 7. Comparison of asymmetry in focusing a shifted vortex beam with m=+2 order for “±”-circular polarization.

Fig. 8. The experimental setup for laser printing. Laser is a solid-state laser (λ=532 nm); L1, L2, L3, L4, L5, and L6 are spherical lenses (f₁=25 mm, f₂=150 mm, f₃=500 mm, f₄=400 mm, f₅=150 mm, and f₆=50 mm); M1, M2, M3, M4, M5, and M6 are mirrors, SLM is a reflective spatial light modulator (HOLOEYE PLUTO VIS); D is a circular diaphragm, BS is a beam splitter, PE is a polarizing element (a half wave or a quarter wave plate), MO1 and MO2 are microobjectives (NA=0.65 and 0.1); S is a glass substrate with a thin azopolymer film; xyz is a three-axis (XYZ) translation stage, IB is a light bulb, F is a neutral density filter, CAM is a ToupCam UCMOS08000KPB video camera. The inset shows an example of a phase mask realized with the SLM and used for the generation of a first-order OV beam.

Fig. 9. Laser patterning of an azopolymer thin film with x-linearly polarized on- and off-axis OV beams of ±1 order. The right part of the figure shows the experimentally generated intensity distribution, numerically calculated distribution of$\nabla$²|E_z|², and atomic force microscopy (AFM) images of microreliefs fabricated in the azopolymer thin film. The scale bar is 5 µm.

Fig. 10. Laser patterning of an azopolymer thin film with y-linearly polarized on- and off-axis OV beams of ±1 order. The right part of the figure shows the experimentally generated intensity distribution, numerically calculated distribution of$\nabla$²|E_z|², and AFM images of microreliefs fabricated in the azopolymer thin film. The scale bar is 5 µm.

Fig. 11. Laser patterning of an azopolymer thin film with right- and left handed circularly polarized on- and off-axis OV beams of ±1 order.The right part of the figure shows the experimentally generated intensity distribution, numerically calculated distribution of$\nabla$²|E_z|², and AFM images of microreliefs fabricated in the azopolymer thin film. The scale bar is 5 µm.