Alexey Porfirev, Svetlana Khonina, Andrey Ustinov, Nikolay Ivliev, Ilya Golub. Vectorial spin-orbital Hall effect of light upon tight focusing and its experimental observation in azopolymer films[J]. Opto-Electronic Science, 2023, 2(7): 230014-1

Search by keywords or author
- Opto-Electronic Science
- Vol. 2, Issue 7, 230014-1 (2023)

Fig. 1. Numerical investigation of vectorial spin-orbital Hall effect of light upon tight focusing: (a ) spatial frequency domain in Cartesian coordinates, (b –d ) on- and off-axis propagation of a circularly polarized first-order optical vortex beam. The symmetry breaking in the longitudinal component and extrinsic OAM are shown.

Fig. 2. Comparison of asymmetry in focusing a shifted vortex beam with m=±1 order for x-linear polarization.

Fig. 3. Comparison of asymmetry in focusing a shifted vortex beam with m=±2 order for x-linear polarization.

Fig. 4. Comparison of asymmetry in focusing a shifted vortex beam with m =±1 order for y -linear polarization.

Fig. 5. Comparison of asymmetry in focusing a shifted vortex beam with m =±2 order for y -linear polarization.

Fig. 6. Comparison of asymmetry in focusing a shifted vortex beam with m=+1 order for “±” -circular polarization.

Fig. 7. Comparison of asymmetry in focusing a shifted vortex beam with m=+2 order for “±”-circular polarization.

Fig. 8. The experimental setup for laser printing. Laser is a solid-state laser (λ=532 nm); L1, L2, L3, L4, L5, and L6 are spherical lenses (f1=25 mm, f2=150 mm, f3=500 mm, f4=400 mm, f5=150 mm, and f6=50 mm); M1, M2, M3, M4, M5, and M6 are mirrors, SLM is a reflective spatial light modulator (HOLOEYE PLUTO VIS); D is a circular diaphragm, BS is a beam splitter, PE is a polarizing element (a half wave or a quarter wave plate), MO1 and MO2 are microobjectives (NA=0.65 and 0.1); S is a glass substrate with a thin azopolymer film; xyz is a three-axis (XYZ) translation stage, IB is a light bulb, F is a neutral density filter, CAM is a ToupCam UCMOS08000KPB video camera. The inset shows an example of a phase mask realized with the SLM and used for the generation of a first-order OV beam.

Fig. 9. Laser patterning of an azopolymer thin film with x-linearly polarized on- and off-axis OV beams of ±1 order. The right part of the figure shows the experimentally generated intensity distribution, numerically calculated distribution of 2|Ez|2, and atomic force microscopy (AFM) images of microreliefs fabricated in the azopolymer thin film. The scale bar is 5 µm.

Fig. 10. Laser patterning of an azopolymer thin film with y-linearly polarized on- and off-axis OV beams of ±1 order. The right part of the figure shows the experimentally generated intensity distribution, numerically calculated distribution of 2|Ez|2, and AFM images of microreliefs fabricated in the azopolymer thin film. The scale bar is 5 µm.

Fig. 11. Laser patterning of an azopolymer thin film with right- and left handed circularly polarized on- and off-axis OV beams of ±1 order. The right part of the figure shows the experimentally generated intensity distribution, numerically calculated distribution of 2|Ez|2, and AFM images of microreliefs fabricated in the azopolymer thin film. The scale bar is 5 µm.

Set citation alerts for the article
Please enter your email address