• Optics and Precision Engineering
  • Vol. 30, Issue 21, 2678 (2022)
Zhe ZHANG, Shengzhen YI, Qiushi HUANG, Shenghao CHEN..., Wenbin LI, Zhong ZHANG and Zhanshan WANG*|Show fewer author(s)
Author Affiliations
  • Institute of Precision Optical Engineering, MOE Key Laboratory of Advanced Micro-Structured Materials, Shanghai Frontiers Science Center of Digital Optics, Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, School of Physics Science and Engineering, Tongji University, Shanghai200092, China
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    DOI: 10.37188/OPE.20223021.2678 Cite this Article
    Zhe ZHANG, Shengzhen YI, Qiushi HUANG, Shenghao CHEN, Wenbin LI, Zhong ZHANG, Zhanshan WANG. Research progress of normal-incidence optical system at extreme ultraviolet (EUV) wavelength[J]. Optics and Precision Engineering, 2022, 30(21): 2678 Copy Citation Text show less
    Schematic of SILEX-I laser facility[6]
    Fig. 1. Schematic of SILEX-I laser facility6
    Result of Schwarzschild imaging system diagnostics
    Fig. 2. Result of Schwarzschild imaging system diagnostics
    Schematic diagram of Schwarzschild imaging system working at 13.5 nm[18]
    Fig. 3. Schematic diagram of Schwarzschild imaging system working at 13.5 nm18
    Best imaging figure and evaluation of spatial resolution[18]
    Fig. 4. Best imaging figure and evaluation of spatial resolution18
    (a) Comparison of results between simulation and experiment at different object distances; (b) Best object points are imaged ten times
    Fig. 5. (a) Comparison of results between simulation and experiment at different object distances; (b) Best object points are imaged ten times
    Schematic of modified Schwarzschild focusing system[31]
    Fig. 6. Schematic of modified Schwarzschild focusing system31
    Schematic diagram of EUV radiation induced damage test platform
    Fig. 7. Schematic diagram of EUV radiation induced damage test platform
    Absolute EUV pulse energy and EUV energy density as a function of inflated gas pressure[19]
    Fig. 8. Absolute EUV pulse energy and EUV energy density as a function of inflated gas pressure19
    AFM image of PMMA irradiated area by EUV radiation[19]
    Fig. 9. AFM image of PMMA irradiated area by EUV radiation19
    Optical path of imaging experiments for four-channel system[17]
    Fig. 10. Optical path of imaging experiments for four-channel system17
    EUV images obtained by four-channel imaging system
    Fig. 11. EUV images obtained by four-channel imaging system
    Schematic of six-channel Schwarzschild system
    Fig. 12. Schematic of six-channel Schwarzschild system
    Zhe ZHANG, Shengzhen YI, Qiushi HUANG, Shenghao CHEN, Wenbin LI, Zhong ZHANG, Zhanshan WANG. Research progress of normal-incidence optical system at extreme ultraviolet (EUV) wavelength[J]. Optics and Precision Engineering, 2022, 30(21): 2678
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