[1] Pliskin W A. Comparison of properties of dielectric films deposited by various methods[J]. J V S T, 1977, 14(5): 1064-1081.
[3] Miloua R, Kebbab Z, Chiker F, et al. Determination of layer thickness and optical constants of thin films by using a modified pattern search method[J]. Optics Letters, 2012, 37(4): 449-451.
[4] Rodenhausen K B, Schmidt D, Kasputis T, et al. Generalized ellipsometry in-situ quantification of organic adsorbate attachment within slanted columnar thin films[J]. Optics Express, 2012, 20(5): 5419-5428.
[5] Guo Chun, Kong Mingdong, Gao Weidong, et al. Simultaneous determination of optical constants, thickness, and surface roughness of thin film from spectrophotometric measurements[J]. Optics Letters, 2013, 38(1): 40-42. (in Chinese)
[6] Tikhonravov A V, Trubetskov M K, Tikhonravov A A, et al. Effects of interface roughness on the spectral properties of thin films and multilayers[J]. Appl Opti, 2003, 42(25): 5140-5148.
[7] Kuhaili M F, Khawaja E E, Durrani S M. Determination of the optical constants(n and k) of inhomogeneous thin films with linear index profiles[J]. Appl Opti, 2006, 45(19): 4591-4597.
[8] Bao Ganghua, Cheng Xinbin, Jiao Hongfei. Study of the evolution of refractive inhonogeneity in HfO2 thin films[J]. Infrared and Laser Engineering, 2015, 44(9): 2761-2766. (in Chinese)
[9] Liu Xin, Shan Fan, Chen Xian, et al. First principles study of the electronic and optical properties of silanone groups in amorphous SiO2 thin films[J]. Jouranl of Atomic and Molecular Physics, 2015, 32(5): 875-878. (in Chinese)
[10] Wang Li, Wang Peng, Wang Gang, et al. Influence of fabrication conditions on inhomogeneity of large dimensions SiO2 thin film[J]. High Power Laser and Particle Beams, 2016, 28(2): 022003-1-022003-6. (in Chinese)
[11] Ya Jing, Yang Ningning, Hu Fengjiao. Study on the optical properties of SiO2 thin film after surface modification[J]. Journal of Synthetic Crystals, 2015, 44(3): 852-856. (in Chinese)
[12] Liu Huasong, Yang Xiao, Wang Lishuan, et al. Charateristics of optical band gap of tantalum oxide thin film by ion beam sputtering technique[J]. Optics and Precision Engineering, 2017, 25(1): 21-27. (in Chinese)
[13] Wu Qian, Chen Songlin, Ma Ping. Spectroscopic ellipsometry of SiO2 and HfO2 thin films with different technics[J]. Infrared and Laser Engineering, 2015, 44(3): 765-769. (in Chinese)
[14] Harland G Tompkins, Eugene A Irene. Handbook of Ellipsometry[M]. Berlin: Springer, 2005.
[15] Dobrowolski J A, Kemp R A. Refinement of optical multilayer systems with different optimization procedures[J]. Appl Opti, 1990, 29(19): 2876-2893.
[16] Douglas C Montgomery. Design and Analysis of Experiments[M]. New Jersey: John-Wiley & Sons, Inc., 2012.
