• Acta Optica Sinica
  • Vol. 26, Issue 5, 767 (2006)
[in Chinese]*, [in Chinese], and [in Chinese]
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    [in Chinese], [in Chinese], [in Chinese]. Controlling the Duty Cycle of Photoresist Gratings by Setting the Guided-Wave Coupling Angles in Monitoring of Photoresist Development[J]. Acta Optica Sinica, 2006, 26(5): 767 Copy Citation Text show less
    References

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    [2] Hehl K, Bischoff J, Mohaupt U et al.. High-efficiency dielectric reflection gratings: design, fabrication, and analysis[J]. Appl. Opt., 1999, 38: 6257~6271

    [3] Michael Perry. Multilayer dielectric gratings: increasing the power of light[J]. Science & Technology Review, 1995. 25~33 (http:∥www.llnl.gov/str/09.95.html)

    [5] Raymond C J, Murnane M R, Naqvi S S H et al.. Metrology of subwavelength photoresist gratings using optical scatterometry[J]. J. Vac. Sci. Technol., 1995, B13(4): 1484~1495

    [6] Coulombe S A, Minhas B K, Raymond C J et al.. Scatterometry measurement of sub-0.1 μm linewidth gratings[J]. J. Vac. Sci. Technol., 1998, B16(1): 80~87

    [7] Huang H T, Terry Jr F L. Spectroscopic ellipsometry and reflectometry from gratings (Scatterometry) for critical dimension measurement and in situ real time process monitoring[J]. Thin Solid Films, 2004, 455~456: 828~836

    [8] Kleinknecht H P, Meier H. Linewidth measurement on IC masks and wafers by grating test patterns[J]. Appl. Opt., 1980, 19(4): 525~533

    [9] Marciante J R, Farmiga N O, Hirsh J I et al.. Optical measurement of depth and duty cycle for binary diffraction gratings with subwavelength features[J]. App. Opt., 2003, 42(16): 3234~3240

    [10] Li Lifeng, Zeng Lijiang. Measurement of duty cycle of photoresist grating masks made on top of multilayer dielectric stacks[J]. Appl. Opt., 2005, 44(21): 1~7 (to be published)

    [11] Tamir T. Integrated Optics[M]. Berlin: Springer-Verlag, 1979. 93~101

    [12] Li Lifeng. Determination of bound modes of multilayer planar waveguides of integration of an initial-value problem[J]. J. Opt. Soc. Am. A, 1994, 11(3): 984~991

    [13] Nevière M. The Homogeneous Problem. in Electromagnetic Theory of Gratings[M]. R. Petit ed., Berlin: Spring-Verlag, 1980. 123~157

    [14] Li Lifeng. Mathematical reflections on the Fourier modal method in grating theory. in Mathematical Modeling in Optical Science, SIAM (Society for Industrial and Applied Mathematics) Frontiers in Applied Mathematics, Eds. G. Bao, L. Cowsar, and W. Masters, SIAM, Philadelphia, 2001. 111~139

    CLP Journals

    [1] Han Jian, Bayanheshig, Li Wenhao, Kong Peng. Profile Evolution of Grating Masks According to Exposure Dose and Interference Fringe Contrast in the Fabrication of Holographic Grating[J]. Acta Optica Sinica, 2012, 32(3): 305001

    [in Chinese], [in Chinese], [in Chinese]. Controlling the Duty Cycle of Photoresist Gratings by Setting the Guided-Wave Coupling Angles in Monitoring of Photoresist Development[J]. Acta Optica Sinica, 2006, 26(5): 767
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