• Laser & Optoelectronics Progress
  • Vol. 48, Issue 6, 60402 (2011)
Lai Jianjun1、2、*, Liang Huafeng2, Wang Bin2, and Zhai Xiaofeng2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3788/lop48.060402 Cite this Article Set citation alerts
    Lai Jianjun, Liang Huafeng, Wang Bin, Zhai Xiaofeng. Narrow-Band Infrared Emission/Absorption Structure Based on Metal-Dielectric-Metal Grating[J]. Laser & Optoelectronics Progress, 2011, 48(6): 60402 Copy Citation Text show less

    Abstract

    A metal-dielectric-metal grating infrared emission/absorption structure is designed for narrow-band infrared emitters or detectors in application of spectral imaging sensors and biomaterial absorption spectroscopy. By using finite difference time domain (FDTD) method, reflection spectrum of the one dimensional Ag/Si3N4/Ag grating structure is simulated. The results show that very narrow mid-infrared emission/absorption peak is generated in this structure for both TE and TM polarizations and emittance above 98% at the central frequencies can be achieved for both polarizations over a broad emission direction. The origin of this performance is believed to come from the excitation of waveguide mode and surface plasmon mode in this structure.
    Lai Jianjun, Liang Huafeng, Wang Bin, Zhai Xiaofeng. Narrow-Band Infrared Emission/Absorption Structure Based on Metal-Dielectric-Metal Grating[J]. Laser & Optoelectronics Progress, 2011, 48(6): 60402
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