All-reflective optical system design for extreme ultraviolet lithography

Jun Chang; Meifang Zou; Ruirui Wang; Shulong Feng; M. M. Talha

doi:10.3788/COL20100811.1082

Journals >Chinese Optics Letters >Volume 8 >Issue 11 >Page 1082 > Article

Chinese Optics Letters
Vol. 8, Issue 11, 1082 (2010)

All-reflective optical system design for extreme ultraviolet lithography

Jun Chang¹, Meifang Zou¹, Ruirui Wang¹, Shulong Feng², and M. M. Talha¹

Author Affiliations

¹Laboratory of Optoelectronics Technology and Information System, School of Optoelectronics, Beijing Institute of Technology, Beijing 100081, China

²Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 343100, China

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DOI: 10.3788/COL20100811.1082 Cite this Article Set citation alerts

Jun Chang, Meifang Zou, Ruirui Wang, Shulong Feng, M. M. Talha. All-reflective optical system design for extreme ultraviolet lithography[J]. Chinese Optics Letters, 2010, 8(11): 1082 Copy Citation Text

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CLP Journals

[1] Cao Yuting, Wang Xiangzhao, Bu Yang, Liu Xiaolei. Analysis of Mask Shadowing Effects in Extreme-Ultraviolet Lithography[J]. Acta Optica Sinica, 2012, 32(8): 805001

[2] Jun Chang, Wubin He, Ruirui Wang, Shulong Feng. Optical system design with conformal decentered and tilted elements[J]. Chinese Optics Letters, 2011, 9(3): 032201

[3] Xu Weicai, Huang Wei, Yang Wang. Magnification Tolerancing and Compensation for the Lithographic Projection Lens[J]. Acta Optica Sinica, 2011, 31(11): 1122003

[4] Ruigang Li. Measurement method for the eccentricity of an off-axis asphere with a laser tracker[J]. Chinese Optics Letters, 2015, 13(Suppl.): S22206

[5] Donglin Xue. Integrated manufacturing technology of off-axis three-mirror anastigmatic system[J]. Chinese Optics Letters, 2014, 12(s2): S21202

Data from CrossRef

[1] Yue Wu, Liping Wang, Jie Yu, Bo Yu, Chunshui Jin. Design method for off-axis aspheric reflective optical system with extremely low aberration and large field of view. Applied Optics, 59, 10185(2020).

[2] Xiaoyu Chen, Yongying Yang, Chen Wang, Dong Liu, Jian Bai, Yibing Shen. Aberration calibration in high-NA spherical surfaces measurement on point diffraction interferometry. Applied Optics, 54, 3877(2015).

Jun Chang, Meifang Zou, Ruirui Wang, Shulong Feng, M. M. Talha. All-reflective optical system design for extreme ultraviolet lithography[J]. Chinese Optics Letters, 2010, 8(11): 1082

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