All-reflective optical system design for extreme ultraviolet lithography

Jun Chang; Meifang Zou; Ruirui Wang; Shulong Feng; M. M. Talha

doi:10.3788/COL20100811.1082

Journals >Chinese Optics Letters >Volume 8 >Issue 11 >Page 1082 > Article

Chinese Optics Letters
Vol. 8, Issue 11, 1082 (2010)

All-reflective optical system design for extreme ultraviolet lithography

Jun Chang¹, Meifang Zou¹, Ruirui Wang¹, Shulong Feng², and M. M. Talha¹

Author Affiliations

¹Laboratory of Optoelectronics Technology and Information System, School of Optoelectronics, Beijing Institute of Technology, Beijing 100081, China

²Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 343100, China

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DOI: 10.3788/COL20100811.1082 Cite this Article Set citation alerts

Jun Chang, Meifang Zou, Ruirui Wang, Shulong Feng, M. M. Talha. All-reflective optical system design for extreme ultraviolet lithography[J]. Chinese Optics Letters, 2010, 8(11): 1082 Copy Citation Text

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Jun Chang, Meifang Zou, Ruirui Wang, Shulong Feng, M. M. Talha. All-reflective optical system design for extreme ultraviolet lithography[J]. Chinese Optics Letters, 2010, 8(11): 1082

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