• Laser & Optoelectronics Progress
  • Vol. 48, Issue 9, 93101 (2011)
Zhu Youzhang1、*, Fu Guanxin1, Wang Hongxia1, Sun Zhen1, and Yuan Jinshe2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3788/lop48.093101 Cite this Article Set citation alerts
    Zhu Youzhang, Fu Guanxin, Wang Hongxia, Sun Zhen, Yuan Jinshe. Luminescence of GaN Thick Film Grown by HVPE[J]. Laser & Optoelectronics Progress, 2011, 48(9): 93101 Copy Citation Text show less

    Abstract

    Unintentionally doped GaN thick film grown on (0001) oriented Al2O3 substrate by hydride vapor phase epitaxy (HVPE) is studied in experiments, by absorption spectra and photoluminescence (PL) spectrum. The blue and yellow luminescence at room temperature are observed. The results indicate that when the frequency is low, the PL spectrum is contained by only band-side emission; however, when the frequency becomes high, there are three emission bands (band-side emission, blue emission and yellow emission). Meanwhile, the higher of the frequency, the larger of I1(intensity of band-side emission) /I2 (intensity of blue emission) and I1/I3 (intensity of yellow emission). After calculation and analysis, it can be considered that the blue luminescence is related with the impurity C of the sample, and the yellow luminescence is related with the structure defects like as dislocations.
    Zhu Youzhang, Fu Guanxin, Wang Hongxia, Sun Zhen, Yuan Jinshe. Luminescence of GaN Thick Film Grown by HVPE[J]. Laser & Optoelectronics Progress, 2011, 48(9): 93101
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