• Optoelectronic Technology
  • Vol. 44, Issue 2, 116 (2024)
Wenjing ZHANG1, Kaixin ZHANG1, Tianxi YANG2, Jie SUN1,3..., Qun YAN2, Chang LIN2, Bingxin JIANG1, Yang LI1, Jinhua LAN1 and Hui CHEN1|Show fewer author(s)
Author Affiliations
  • 1National and Local United Engineering Laboratory of Flat Panel Display Technology, Fuzhou University, and Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou 35000, CHN
  • 2Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou 350100, CHN
  • 3Quantum Device Physics Laboratory, Chalmers University of Technology, Göteborg41296, Sweden
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    DOI: 10.12450/j.gdzjs.202402006 Cite this Article
    Wenjing ZHANG, Kaixin ZHANG, Tianxi YANG, Jie SUN, Qun YAN, Chang LIN, Bingxin JIANG, Yang LI, Jinhua LAN, Hui CHEN. A Calibration Scheme for Chip Engraving Based on Imperfectly Matched Mask[J]. Optoelectronic Technology, 2024, 44(2): 116 Copy Citation Text show less
    References

    [2] Baek D, Lee S H, Jun B H et al. Lithography technology for micro- and nanofabrication[J]. Nanotechnology for Bioapplications, 1309, 217-233(2021).

    [3] Van Haren R, Steinert S, Mouraille O et al. Wafer alignment mark placement accuracy impact on the layer-to-layer overlay performance[C], 11148, 199-208(2019).

    [4] Zhao X, Xu F, Tang L et al. Microfluidic chip-based C elegans microinjection system for investigating cell-cell communication in vivo[J]. Biosensors & Bioelectronics, 50, 28-34(2013).

    [7] Schneider A, Su B, Button T W et al. Comparison of PMMA and SU-8 resist moulds for embossing of PZT to produce high-aspect-ratio microstructures using LIGA process[J]. Microsystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systems, 8, 88-92(2002).

    [8] Gabor A H, Felix N M. Overlay error statistics for multiple-exposure patterning[J]. Journal of Micro-Nanolithography Mems and Moems, 18(2019).

    [9] Perumal V, Hashim U, Adam T. Mask design and fabrication of micro/nanowire biochip for reliable and repeatability pattern transfer[J]. International Conference on Nanoscience and Nanotechnology, 832, 79-83(2013).

    [10] Orji N G, Badaroglu M, Barnes B M et al. Metrology for the next generation of semiconductor devices[J]. Nature Electronics, 1, 662(2018).

    Wenjing ZHANG, Kaixin ZHANG, Tianxi YANG, Jie SUN, Qun YAN, Chang LIN, Bingxin JIANG, Yang LI, Jinhua LAN, Hui CHEN. A Calibration Scheme for Chip Engraving Based on Imperfectly Matched Mask[J]. Optoelectronic Technology, 2024, 44(2): 116
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