Wenjing ZHANG, Kaixin ZHANG, Tianxi YANG, Jie SUN, Qun YAN, Chang LIN, Bingxin JIANG, Yang LI, Jinhua LAN, Hui CHEN. A Calibration Scheme for Chip Engraving Based on Imperfectly Matched Mask[J]. Optoelectronic Technology, 2024, 44(2): 116
- Optoelectronic Technology
- Vol. 44, Issue 2, 116 (2024)
Fig. 1. The selected alignment mark
Fig. 2. Alignment process of overlay
Fig. 3. Optical picture of the target pattern under the lithographic microscope system
Fig. 4. Photos of the first alignment
Fig. 5. The results of the first alignment exposure and development
Fig. 6. Photos of the second alignment
Fig. 7. Photos of the second alignment calibration
Fig. 8. The results of the second alignment calibration exposure
Fig. 9. Optical images after using the calibration scheme
Set citation alerts for the article
Please enter your email address
© Copyright 2018-2021 | Chinese Laser Press. All Rights Reserved 沪ICP备15018463号-20