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    Journals >Opto-Electronic Engineering >Volume 33 >Issue 8 >Page 117 > Article
    • Opto-Electronic Engineering
    • Vol. 33, Issue 8, 117 (2006)
    Influence of tilt in stitching interferometry and how to eliminate it
    [in Chinese]1、2 and [in Chinese]1
    Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: Cite this Article
    [in Chinese], [in Chinese]. Influence of tilt in stitching interferometry and how to eliminate it[J]. Opto-Electronic Engineering, 2006, 33(8): 117 Copy Citation Text show less
    References

    [2] Michael Bray.Stitching Interferometer for large plano optics using a standard interferometer[J].SPIE,1997,3134:39-50.

    [5] Stephen C.JENSEN,Weng W.CHOW,George N.Lawrence.Subaperture testing approaches:a comparison[J].Applied Optics,1984,23:740-745.

    [6] Michael BRAY.Stitching interferometer for large optics:Recent developments of a system[J].SPIE,1998,3492:946-956.

    CLP Journals

    [1] Ma Chuntao, Luo Hongxin, Wang Jie, Song Li. Surface Error Measurement of Plane Mirrors Based on Oblique Incidence[J]. Laser & Optoelectronics Progress, 2011, 48(7): 71201

    [2] WANG Yue-zhu, TIAN Yi, LI Hong-yu, JU You-lun. Sub-aperture Stitching Interference Measurement Method Based on Marker Location and Global Optimization[J]. Opto-Electronic Engineering, 2009, 36(5): 83

    [3] TIAN Ailing, WU Shixia, LIU Bingcai, ZHANG Peifei. Global Optimization Algorithm of Subaperture Stitching Weight Coefficients[J]. Acta Photonica Sinica, 2013, 42(8): 943

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    [in Chinese], [in Chinese]. Influence of tilt in stitching interferometry and how to eliminate it[J]. Opto-Electronic Engineering, 2006, 33(8): 117
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