• Laser & Optoelectronics Progress
  • Vol. 59, Issue 3, 0319001 (2022)
Jie Zhang1、2、*, Shanchao Zhao1, Bing Han1, and Guodong Zhang1
Author Affiliations
  • 1College of Physics and Electronic Engineering, Northwest Normal University, Lanzhou , Gansu 730070, China
  • 2Engineering Research Center of Gansu Province for Intelligent Information Technology and Application, Northwest Normal University, Lanzhou , Gansu 730070, China
  • show less
    DOI: 10.3788/LOP202259.0319001 Cite this Article Set citation alerts
    Jie Zhang, Shanchao Zhao, Bing Han, Guodong Zhang. Influence of Uniform Unmagnetized Plasma on Electromagnetic Wave Absorption Characteristics[J]. Laser & Optoelectronics Progress, 2022, 59(3): 0319001 Copy Citation Text show less

    Abstract

    Based on the "blackout", the physical model of "free space-plasma layer-free space" is established. On the basis of this model, the analytical method is used to simulate and study the relationship between plasma absorption rate and electromagnetic wave frequency under the premise of different thickness plasma layer. The absorption of left-handed and right-handed circularly polarized waves by plasma layer and the one-way attenuation of electromagnetic waves in plasma were studied by changing the electron density, external magnetic field intensity and electron collision frequency, respectively. The results show that the absorption characteristics and one-way attenuation of electromagnetic waves by plasma change with the change of plasma layer thickness, electron density, external magnetic field strength, and electron collision frequency. The simulation results can be used as a reference for reducing the absorption rate of plasma layer and alleviating the problem of the "blackout".
    Jie Zhang, Shanchao Zhao, Bing Han, Guodong Zhang. Influence of Uniform Unmagnetized Plasma on Electromagnetic Wave Absorption Characteristics[J]. Laser & Optoelectronics Progress, 2022, 59(3): 0319001
    Download Citation