• Chinese Journal of Lasers
  • Vol. 33, Issue 6, 837 (2006)
[in Chinese]1、2、*, [in Chinese]1, [in Chinese]2, [in Chinese]1, [in Chinese]1, and [in Chinese]
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • show less
    DOI: Cite this Article Set citation alerts
    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Laser-Induced Damage of Flat Polarizer Prepared by Electron Beam Evaporation[J]. Chinese Journal of Lasers, 2006, 33(6): 837 Copy Citation Text show less
    References

    [1] P. F. Gu, J. F. Tang. Laser-induced damage resistance of thin-film polarizers prepared by ion-assistant deposition [J]. Opt. Lett., 1994, 19(2):81~83

    [2] U. B. Schallenberg, N. Kaiser. Damage-resistant thin-film plate polarizer [C]. SPIE, 1997, 2966:243~249

    [3] F. Y. Génin, C. J. Stolz, M. R. Kozlowski. Growth of laser-induced damage during repetitive illumination of HfO2-SiO2 multilayer mirror and polarizer coatings [C]. 28th Annual Symposium on Optical Materials for High Power Lasers Boulder, Colorado October 7~9, 1996. 1~10

    [4] F. Y. Génin, C. J. Stolz, T. Reitter et al.. Effect of electric field distribution on the morphologies of laser-induced damage in hafnia-sillica multiplayer polarizers [C]. SPIE, 1997, 2966:342~345

    [5] Lasers and laser-related equipment—Determination of laser induced damage threshold of optical surface [S ]. 2000. ISO11254-1.2

    [6] Laser Induced Damage Threshold and Certification Procedures of Optical Materials [ M]. NASA Reference Publication 1395 (1997)

    [7] C. Floch, A. Roussel, C. Cordillot et al.. High damage threshold mirror and polarizers in the ZrO2/SiO2 and HfO2/SiO2 dielectric systems [C]. SPIE, 1992, 1624:282~293

    CLP Journals

    [1] Chen Naibo, Wu Yonggang, Lin Leijie, Jiao Hongfei, Wang Zhenhua. Thin-Film Polarizers Designed by the Needle Method[J]. Acta Optica Sinica, 2010, 30(2): 590

    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Laser-Induced Damage of Flat Polarizer Prepared by Electron Beam Evaporation[J]. Chinese Journal of Lasers, 2006, 33(6): 837
    Download Citation