• Chinese Journal of Lasers
  • Vol. 33, Issue 6, 837 (2006)
[in Chinese]1、2、*, [in Chinese]1, [in Chinese]2, [in Chinese]1, [in Chinese]1, and [in Chinese]
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  • 1[in Chinese]
  • 2[in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Laser-Induced Damage of Flat Polarizer Prepared by Electron Beam Evaporation[J]. Chinese Journal of Lasers, 2006, 33(6): 837 Copy Citation Text show less

    Abstract

    The flat polarizer was prepared by electron beam evaporation and its optical performance was measured by Lambda900 spectrometer. The transmission of P-polarization is more than 98%, the transmission of S-polarization is less than 0.5%, its extinction ratio is more than 200:1, and its spectral bandwidth is 20 nm near 1053 nm. The laser-induced damage thresholds (LIDTs) of P-polarization and S-polarization are 17.2 J/cm2 and 19.6 J/ cm2, respectively, measured at 1064 nm wavelength,12-ns pulse width and the incident angle of 60°. The morphology of the laser-induced damage was characterized by Nomarski microscopy and its depth was measured by Alpha-500 step meter. Two distinct damage morphologies (defect and delamination) were observed when polarizer was tested in P-polarization. The character of interface caused the outer layer delamination damage morphology and which happened at hafnia-silica interface of the outer layer. The defect damage was induced by the defects in the film, and it appeared in the interior of the polarizer. In the case of S-polarization,the outer layer delamination damage morphology,which was induced by standing electric field was also observed.
    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Laser-Induced Damage of Flat Polarizer Prepared by Electron Beam Evaporation[J]. Chinese Journal of Lasers, 2006, 33(6): 837
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