• INFRARED
  • Vol. 44, Issue 2, 18 (2023)
Zhen LI*, Dan WANG, Da GAO, and Wei-rong XING
Author Affiliations
  • [in Chinese]
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    DOI: 10.3969/j.issn.1672-8785.2023.02.004 Cite this Article
    LI Zhen, WANG Dan, GAO Da, XING Wei-rong. Study on Dislocation Suppression of Si-based CdTe Materials by In-situ Annealing[J]. INFRARED, 2023, 44(2): 18 Copy Citation Text show less
    References

    [1] Gravrand O, Destefanis G, Bisotto S, et al. Issues in HgCdTe Research and Expected Progress in Infrared Detector Fabrication [J]. Journal of Electronic Materials, 2013, 42(11): 3349-3358.

    [2] Reddy M, Peterson J M, Vang T, et al. Molecular Beam Epitaxy Growth of HgCdTe on Large-Area Si and CdZnTe Substrates [J]. Journal of Electronic Materials, 2011, 40(8): 1706-1716.

    [5] Yamaguchi M, Yamamoto A, Tachikawa M, et al. Defect Reduction Effects in GaAs on Si Substrates by Thermal Annealing [J]. Applied Physics Letters, 1998, 53(23): 4518-4522.

    [6] Farrell S, Brill G, Chen Y, et al. Ex Situ Thermal Cycle Annealing of Molecular Beam Epitaxy Grown HgCdTe/Si Layers [J]. Journal of Electronic Materials, 2010, 39(1): 43-48.

    [8] Wijewarnasuriya P S. Dislocation Reduction in HgCdTe Grown on CdTe/Si [C]. SPIE, 2016, 9854: 98540B.

    LI Zhen, WANG Dan, GAO Da, XING Wei-rong. Study on Dislocation Suppression of Si-based CdTe Materials by In-situ Annealing[J]. INFRARED, 2023, 44(2): 18
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