A lithographic tool-matching method using a differential evolution algorithm and a micro mirror array (MMA) source model is proposed herein. In this method, the MMA source model is added, and the light spots of micro mirrors are optimized by the differential evolution algorithm to achieve lithographic tool-matching. Compared with other matching methods for the freeform illumination system, the proposed method can directly optimize MMA parameters and reduce matching errors in the process of MMA generating light source. A one-dimensional line/space mask is adopted for matching under quasar and freeform illumination. The simulation results show that the root-mean-square of critical dimension error decreases by more than 80% after matching. The proposed method outperforms the matching methods based on the genetic algorithm and particle swarm optimization algorithm. Further, the convergence is accelerated. Moreover, the proposed method can effectively control the pupil fill ratio and keep it constant before and after matching.