• Chinese Optics Letters
  • Vol. 7, Issue 12, 1109 (2009)
Invited Paper
Author Affiliations
  • G. Pedrini1*, J. Gaspar2, O. Paul2, and W. Osten1
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    DOI: 10.3788/COL20090712.1109 Cite this Article Set citation alerts
    Invited Paper. Measurement of in-plane deformations of microsystems by digital holography and speckle interferometry[J]. Chinese Optics Letters, 2009, 7(12): 1109 Copy Citation Text show less

    Abstract

    The reliability of microsystem is an important issue and for their quality inspection, it is necessary to know the displacements or deformations due to the applied mechanical, thermal, or electrostatic loads. We show interferometrical techniques like digital holography and speckle interferometry can be used for the measurement of in plane deformations of microsystems with nanometric accuracy and we give a description of the measurement uncertainties.
    Invited Paper. Measurement of in-plane deformations of microsystems by digital holography and speckle interferometry[J]. Chinese Optics Letters, 2009, 7(12): 1109
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