• Opto-Electronic Engineering
  • Vol. 46, Issue 5, 180444 (2019)
Zhang Yuhu*, Xu Haitao, Li Yawen, Luo Chuanwen, Cao Shaobo, and Li Li
Author Affiliations
  • [in Chinese]
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    DOI: 10.12086/oee.2019.180444 Cite this Article
    Zhang Yuhu, Xu Haitao, Li Yawen, Luo Chuanwen, Cao Shaobo, Li Li. The improvement of TFT lithography plane compensation[J]. Opto-Electronic Engineering, 2019, 46(5): 180444 Copy Citation Text show less
    References

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    [7] Chun J Y, KangC H, Ahn S J, et al. A-Si TFT-LCD mobile display with high pixel density using PenTile RGB WTM algo-rithm[J]. Chinese Journal of Liquid Crystals and Displays, 2006, 21(5): 474–477.

    [8] Feng B R, Zhang J, Hou D S, et al. Optical microlithography with phase-shifting mask and optical proximity effect correc-tion[J]. Opto-Electronic Engineering, 2001, 28(1): 1–5.

    [9] Miu X Y. Focal Plane Measure and Control Study[D]. Shanghai: Fudan University, 2006: 5–9.

    [10] LiWS, Hui G B, Cui C Z, et al. Preliminary study on improving photolithographic resolution of display technology with phase shift mask[J]. Optoelectronic Technology, 2014, 34(4): 234–237.

    Zhang Yuhu, Xu Haitao, Li Yawen, Luo Chuanwen, Cao Shaobo, Li Li. The improvement of TFT lithography plane compensation[J]. Opto-Electronic Engineering, 2019, 46(5): 180444
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