[2] Oikawa M, Iga K, Sanada T, et al. Array of distributed-index planar micro-lenses prepared from ion exchange technique[J]. Japanese Journal of Applied Physics, 1981, 20(4): L296–L298.
[3] Totsu K, Fujishiro K, Tanaka S, et al. Fabrication of three-dimensional microstructure using maskless gray-scale lithography[J]. Sensors and Actuators A: Physical, 2006, 130-131: 387–392.
[4] Shiang J J, Faircloth T J, Duggal A R. Experimental demon-stration of increased organic light emitting device output via volumetric light scattering[J]. Journal of Applied Physics, 2004, 95(5): 2889–2895.
[5] Kim C S, Ahn S H, Jang D Y. Review: developments in mi-cro/nanoscale fabrication by focused ion beams[J]. Vacuum, 2012, 86(8): 1014–1035.
[7] Sun Fengqiang, Cai Weiping, Li Yue, et al. Nanoparticle array synthesized by two-dimensional colloid crystal lithography[J]. Physics, 2003, 32(4): 223–227.
[8] Hanarp P. Optical properties of nanometer disks, holes and rings prepared by colloidal lithography[D]. G teborg: Chalmers University of Technology, 2003: 1–56.
[9] Gan Daiwei. Fabrication technology research of microlens array[J]. Equipment Manufacturing Technology, 2011(9): 44–45, 49.
[10] Ni Z H, Wang H M, Kasim J, et al. Graphene thickness de-termination using reflection and contrast spectroscopy[J]. Nano Letters, 2007, 7(9): 2758–2763.
[11] Lim C S, Hong M H, Lin Y, et al. Microlens array fabrication by laser interference lithography for super-resolution surface nanopatterning[J]. Applied Physics Letters, 2006, 89(19): 191125.
[12] Tang Xionggui, Yao Xin, Guo Yongkang, et al. Effect of baking process conditions on surface profile of lithography for thick film resists[J]. Microfabrication Technology, 2005(3): 31–35.
