• Laser & Optoelectronics Progress
  • Vol. 58, Issue 19, 1931002 (2021)
Ganghua Bao*, Yujiang Xie, Ben Wang, and Yu Liang
Author Affiliations
  • Shanghai Multiple Films & Laser Tech. Co. Ltd., Shanghai 201306, China
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    DOI: 10.3788/LOP202158.1931002 Cite this Article Set citation alerts
    Ganghua Bao, Yujiang Xie, Ben Wang, Yu Liang. Half-Wave Hole Suppression of Harmonic Beam Splitting Films[J]. Laser & Optoelectronics Progress, 2021, 58(19): 1931002 Copy Citation Text show less
    Admittance locus of 0.5LH0.5L at half wave with conventional structure
    Fig. 1. Admittance locus of 0.5LH0.5L at half wave with conventional structure
    Designed spectra of (0.5LH0.5L)n
    Fig. 2. Designed spectra of (0.5LH0.5L)n
    Admittance locus of HL at half wave with conventional structure
    Fig. 3. Admittance locus of HL at half wave with conventional structure
    Optical admittance locus of film stack 0.5LH 0.5LHL
    Fig. 4. Optical admittance locus of film stack 0.5LH 0.5LHL
    Designed spectra of (0.5LH0.5LHL)10
    Fig. 5. Designed spectra of (0.5LH0.5LHL)10
    Design and test curves of improved harmonic beam splitting film
    Fig. 6. Design and test curves of improved harmonic beam splitting film
    Ganghua Bao, Yujiang Xie, Ben Wang, Yu Liang. Half-Wave Hole Suppression of Harmonic Beam Splitting Films[J]. Laser & Optoelectronics Progress, 2021, 58(19): 1931002
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