A Novel Two-Step Alignment Technique for Imprint Lithography

Wang Li; Lu Bingheng; Ding Yucheng; Liu Hongzhong

Journals >Acta Photonica Sinica >Volume 35 >Issue 10 >Page 1608 > Article

Acta Photonica Sinica
Vol. 35, Issue 10, 1608 (2006)

A Novel Two-Step Alignment Technique for Imprint Lithography

Wang Li^*, Lu Bingheng, Ding Yucheng, and Liu Hongzhong

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[in Chinese]

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DOI: Cite this Article

Wang Li, Lu Bingheng, Ding Yucheng, Liu Hongzhong. A Novel Two-Step Alignment Technique for Imprint Lithography[J]. Acta Photonica Sinica, 2006, 35(10): 1608 Copy Citation Text

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References

[1] Stephen A C. The science and engineering of microelectronic fabrication,second edition,New York:Oxford University Press,2001.17～18

[2] Chou S Y,Chris K. Ultrafast and direct imprint of nanostructures in silicon. Nature,2002,417(20):835～838

[3] Otto M. Characterization and application of a UV-based imprint technique. Microelectronic Engineering,2001,57(9):361～366

[4] James R S,Bruce W S. Microlithography: science and technology. New York: Marcel Dekker Inc,1998.317～367

[5] Liu Z W,Xie H M,Fang D N,et al. Acta Photonica Sinica,2005,34(9):1431～1433

[6] Tang X G,Gao F H,Gao F,et al. Acta Photonica Sinica,2005,34(6):881～884

Wang Li, Lu Bingheng, Ding Yucheng, Liu Hongzhong. A Novel Two-Step Alignment Technique for Imprint Lithography[J]. Acta Photonica Sinica, 2006, 35(10): 1608

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