• Acta Photonica Sinica
  • Vol. 35, Issue 10, 1608 (2006)
Wang Li*, Lu Bingheng, Ding Yucheng, and Liu Hongzhong
Author Affiliations
  • [in Chinese]
  • show less
    DOI: Cite this Article
    Wang Li, Lu Bingheng, Ding Yucheng, Liu Hongzhong. A Novel Two-Step Alignment Technique for Imprint Lithography[J]. Acta Photonica Sinica, 2006, 35(10): 1608 Copy Citation Text show less

    Abstract

    A two-step alignment,coarse-fine alignment,is proposed for obtaining high alignment accuracy in room-temperature imprint lithography process. A pair of special slant gratings are used as alignment marks. Coarse alignment was realized by observing the borderlines of the superposed marks through object lens,and alignment accuracy is within the capture range of fine alignment. The Moiré signals in the linear region for fine alignment generated by the alignment marks were detected by a photo-detector array and used to estimate the fine alignment errors in x and y directions respectively. Since the linear region of moiré signal is very steep,the signals highly sensitive to alignment error can be obtained and used to control the alignment of a X-Y stage by fine positioning. The final alignment accuracy can reach ±21 nm in x direction and±24 nm in y direction.
    Wang Li, Lu Bingheng, Ding Yucheng, Liu Hongzhong. A Novel Two-Step Alignment Technique for Imprint Lithography[J]. Acta Photonica Sinica, 2006, 35(10): 1608
    Download Citation