[1] Ni T L, Ding F, Zhu X D. Appl. Phys. Lett., 2008, 92: 1503.

[2] Li Qing, Tidemasa H, Pu Yi-kang, et al. Appl. Phys. Letters, 2011, 98(5): 241501.

[3] Ráhel J, Sherman D M. J. Phys. D: Appl. Phys., 2005, 38: 547.

[4] Iza F, Kim G J, Lee S M, et al. Plasma Processes Polym., 2008, 5: 322.

[5] Fridman G, Friedman G, Gutsol A, et al. Plasma Process. Polym., 2008, 5: 503.

[6] Kong M G, Kroesen G, Morfill G, et al. New J. Phys., 2009, 11: 115012.

[7] Cheng C, Liu P, Xu L, et al. Chin. Phys. Soc., 2006, 15(07): L1544-5.

[8] Chen G L, Chen S H, Zhou M Y, et al. Plasma Sources Sci. Technol., 2006, 15, 603.

[9] Lu X P, Xiong Z, Zhao F, et al. Appl. Phys. Letters, 2009, 95: 181501.

[10] Li X C, Yuan Y, Jia P Y, et al. Phys. Plasma, 2010, 17: 093504.

[11] Hong Y C, Kang W S, Hong Y B, et al. Phys. Plasma, 2009, 16: 123502.