Study on Electrode Contact Hole Etching Technique of Long-Wave Infrared HgCdTe Focal Plane Detectors with Low Damage

Jing-feng LI; Shi-guang LIU; Ti NING; Ming LIU; Dan WANG

doi:10.3969/j.issn.1672-8785.2023.11.002

Journals >INFRARED >Volume 44 >Issue 11 >Page 6 > Article

INFRARED
Vol. 44, Issue 11, 6 (2023)

Study on Electrode Contact Hole Etching Technique of Long-Wave Infrared HgCdTe Focal Plane Detectors with Low Damage

Jing-feng LI, Shi-guang LIU, Ti NING, Ming LIU, and Dan WANG

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[in Chinese]

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DOI: 10.3969/j.issn.1672-8785.2023.11.002 Cite this Article

LI Jing-feng, LIU Shi-guang, NING Ti, LIU Ming, WANG Dan. Study on Electrode Contact Hole Etching Technique of Long-Wave Infrared HgCdTe Focal Plane Detectors with Low Damage[J]. INFRARED, 2023, 44(11): 6 Copy Citation Text

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References

[2] Ragalski A. Recent Progress in Infrared Detector Technologies \[J\]. Infrared Physics and Technology, 2011, 54: 136-164.

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