• Laser & Optoelectronics Progress
  • Vol. 61, Issue 4, 0422001 (2024)
Qiuyun Xu* and Lingchen Kong
Author Affiliations
  • School of Photoelectric Engineering, Changzhou Institute of Technology, Changzhou 213032, Jiangsu, China
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    DOI: 10.3788/LOP232075 Cite this Article Set citation alerts
    Qiuyun Xu, Lingchen Kong. Error Calibration Method of Null Correctors for Large-Aperture Aspherical Mirrors[J]. Laser & Optoelectronics Progress, 2024, 61(4): 0422001 Copy Citation Text show less
    Pattern distribution of CGH
    Fig. 1. Pattern distribution of CGH
    Optical layout of the calibration of Offner null using CGH
    Fig. 2. Optical layout of the calibration of Offner null using CGH
    The optical layout of concave hyperboloid mirror by Offner compensator
    Fig. 3. The optical layout of concave hyperboloid mirror by Offner compensator
    Ray tracing schematic diagram
    Fig. 4. Ray tracing schematic diagram
    The image quality of calibration path. (a) Spot diagram; (b) wavefront function
    Fig. 5. The image quality of calibration path. (a) Spot diagram; (b) wavefront function
    CGH phase function and spatial frequency distribution
    Fig. 6. CGH phase function and spatial frequency distribution
    Optical layout of the alignment hologram
    Fig. 7. Optical layout of the alignment hologram
    Alignment hologram patterns (line width magnified by 200 times )
    Fig. 8. Alignment hologram patterns (line width magnified by 200 times )
    Calibration experiment of Offner compensator
    Fig. 9. Calibration experiment of Offner compensator
    Calibration result of the Offner compensator
    Fig. 10. Calibration result of the Offner compensator
    The Φ856 mm concave hyperboloid mirror and its surface measured by the calibrated Offner compensator
    Fig. 11. The Φ856 mm concave hyperboloid mirror and its surface measured by the calibrated Offner compensator
    A1A2A3A4A5A6A7A8
    -5.19×1015.27×10-3-1.99×10-61.09×10-9-6.38×10-133.09×10-16-9.79×10-201.43×10-23
    Table 1. Coefficients of even polynomials
    IndexWith powerWithout power
    PV0.15λ0.083λ
    RMS0.029λ0.013λ
    Table 2. Substrate shape error (λ = 0.6328 μm)