Based on the rigorous couple-wave analysis(RCWA) method, columned antireflective microstructure on surface of Si substrate though the MATLAB software was optimized and antireflective effect combination structure parameters were obtained, and periodic two-dimensional array of cylindrical micro-structure expression was deduced, so that the reflectance of the design value was 3%. The single and double microstructure were fabricated by reactive ion etching and binary exposure technology, and its surface topography was analyzed by thermal field emission scanning electron microscopy(SEM), combined with infrared imaging spectrometer for measurement and analysis of its production structure. The results reveal that the reactive gas flow rate, Radio Frequency(RF) power and chamber pressure are critical for the morphology of the microstructure and the steepness of sidewall. The effect of profile shape of the anti-reflective properties in actual manufacturing process was discussed, and its surface topography was analyzed by thermal field emission scanning electron microscopy(JSM-7800F), combined with infrared imaging spectrometer (Spotlight 400) for measurement and analysis of its production structure. The experimental results illustrate that the double-sided columned microstructure can have excellent average anti-reflective rate preferably about 8%. Basic design reaches the design requirements.