• Acta Optica Sinica
  • Vol. 26, Issue 6, 943 (2006)
[in Chinese]1、2、*, [in Chinese]2, [in Chinese]2, [in Chinese]2, and [in Chinese]2
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Optical Constants of Ion Beam Sputtering Deposited Copper Films of Different Thickness[J]. Acta Optica Sinica, 2006, 26(6): 943 Copy Citation Text show less
    References

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    [3] G. Schneider, D. Hambach, B. Niemann et al.. In situ X-ray microscopic observation of the electromigration in passivated Cu interconnects[J]. Appl. Phys. Lett., 2001, 78(13): 1936~1940

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    [15] Dwight E. Gray. American Institute of Physics Handbook[M]. New York: Mcgraw-Hill, 1963. 6~103

    [16] Louis Harris, Arthur L. Loeb. Evaluation and analysis of optical and electrical constants of thin films as functions of reflectance and transmission data by electronic digital computation[J]. J. Opt. Soc. Am., 1954, 45(3): 179~188

    [22] R. W. Cohen, G. D. Cody, M. D. Coutts et al.. Optical properties of granular silver and gold films[J]. Phys. Rev. B, 1973, 8(8): 3689~3701

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Optical Constants of Ion Beam Sputtering Deposited Copper Films of Different Thickness[J]. Acta Optica Sinica, 2006, 26(6): 943
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