[1] G.H.Haertling. PLZT electro-optic materials and applications-A review. Ferroelectrics, 1987,75:25
[2] Vest R. Metallo-organic decomposition(MOD) processing of ferroelectric and electro-optic films: A review. Ferroelectrics, 1990,102:53
[3] MENG Xiang-Jian, CHEN Jian-Gong, YE Hong-Juan, et al. Characterization of the crystallization behaviors in the PbTiO3 thin films on Si substrates by an infrared spectroscopy technique. Infrared Physics and Technology, 2000,41:47
[4] Fedorov I, Petzelt J, Zelezny V, et al. Far-infrared dielectric response of PbTiO3 and PbZr1-xTixO3 thin ferroelectric films. J. Phys: Condens. Matter, 1995, 7:4313
[5] Taguchi I, Pignolet A, Wang L, et al. Raman scattering from PbTiO3 thin films prepared on silicon substrates by radio frequency sputtering and thermal treatment. J.Appl.Phys.,1993,73(1):394
[6] Ching-Prado E, Reynes-Figueroa A, Katiyar R S, et al. Raman spectroscopy and x-ray diffraction of PbTiO3 thin films. J.Appl.Phys.,1995,78(3):1920
[7] HUANG Zhi-Ming, MENG Xiang-Jian, YANG Ping-Xiong, et al. Optical properties of PbZrxTi1-xO3 on platinized silicon by infrared spectroscopic ellipsometry. Appl.Phys.Lett., 2000,76(26):3980
[9] Xu Y, PENG C H, Mackenize J D. Electrical characterizations of polycrystalline and amorphous thin films of Pb(ZrxTi1-x)O3 and BaTiO3 prepared by sol-gel technique. J.Non-Cryst.Solids,1994,176:1
[10] Adachi H, Mitsuyu T, Yamazaki O, et al. Ferroelectric (Pb,La)(Zr,Ti)O3 epitaxial thin films on sapphire grown by rf-planar magnetron sputtering. J.Appl.Phys.,1986,60(2):736
[11] Okuyama M, Usuki T, Hamakawa Y, et al. Epitaxial growth of ferroelectric PLZT thin film and their optical properties. Appl.Phys.,1980,21:339
[12] Thomas R, Dube D C. Structural, electrical and optical properties of sol-gel processed Lead Titanate thin films. Jpn.J.Appl.Phys.,1997,36(12A):7337
[13] Manifacier J C, Gasiot J, Fillard J P. A simple method for the determination of the optical constants n,k and the thickness of a weakly absorbing thin film. J.Phys.E., 1976,9:1002
[14] Swanepoel R. Determination of the thickness and optical constants of amorphous silicon. J.Phys. E:Sci.Instrum., 1983,16;1214
[15] Krempasky J, Wang L, Proctor M, et al. Optical properties of PZT and PMZT sputtered thin films. Solid State Communications. 1991,78(12):1039
[16] ZHU De-Rui,LI Qiu-Jun, LAI Tian-Shu, et al. Optical properties of Lead Lanthanum Zirconate Titanate amorphous thin films. Thin Solid Films, 1998,314:210
[18] Thomas R, Dube D C, Kamalasanan M N, et al. Optical and electrical properties of BaTiO3 thin films prepared by chemical solution deposition. Thin Solid Films, 1999,346;212
[19] J.C.Tauc, Amorphous and Liquid Semiconductor, Plenum Press, New York,1974,pp159
[20] XIAO Ding-Quan, PENG Wen-Bing, QIAN Zheng-Hong, et al. Optical and infrared transmission characteristics of (Pb,La)TiO3 thin films. Phys.Stat.Sol.(1),1994,145:K67