• Acta Optica Sinica
  • Vol. 19, Issue 7, 953 (1999)
[in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]2, and [in Chinese]3
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3Central Microstructure Facility, Ratherford Appleton Lab. Chilton, Didcot, OX11 OQX, UK
  • show less
    DOI: Cite this Article Set citation alerts
    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Optical Proximity Correction in Laser Direct Writing[J]. Acta Optica Sinica, 1999, 19(7): 953 Copy Citation Text show less
    References

    [1] Langlois P. DOE fabricated by laser writing and other technique. Proc. SPIE, 1992, 1751:2~12

    [4] Levenson M D. Extending the lifetime of optical lithography technology with wavefront engineering. Jpn. J. Appl. Phys., 1994, 33(12B):6765~6773

    [5] Babin S. Measuring the proximity effects in laser pattern generation. Opt. Engng., 1997, 36(9):2508~2512

    CLP Journals

    [1] Song Jing, Geng Yongyou. Preparation of Polyvinyl Alcohol (PVA)/Siver (Ag) Nanocomposite Film Applied in Laser Direct Writing of Blue Ray (405 nm)[J]. Acta Optica Sinica, 2012, 32(9): 931003

    [2] ZHANG Shan, WANG Lei. Optical Proximity Correction for Low Resolution Acoustooptic Modulator[J]. Opto-Electronic Engineering, 2012, 39(4): 129

    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Optical Proximity Correction in Laser Direct Writing[J]. Acta Optica Sinica, 1999, 19(7): 953
    Download Citation