[1] R. Adar, Y. Shani, C.H. Henry et al.. Measurement of very low-loss silica on silicon waveguides with a ring resonator[J]. Appl. Phys. Lett., 1991, 58(5): 444~445
[2] V. Van, P. P. Absil, J. V. Hrynie wicz et al.. Propagation loss in single-mode GaAs-AlGaAs microring resonators: measurement and model[J]. J. Lightw. Technol., 2001, 19(11): 1734~1739
[3] R. Regener, W. Sohler. Loss in low-finesse TiLiNbO3 optical waveguide resonators[J]. Appl. Phys. B, 1985, 36(3): 143~147
[4] R. G. Walker. Simple and accurate loss measurement technique for semiconductor optical waveguides[J]. Electron. Lett., 1985, 21(13): 581~583
[5] L. S. Yu, Q. Z. Liu, S. A. Pappert et al.. Laser spectral linewidth dependence on waveguide loss measurements using the Fabry-Perot method[J]. Appl. Phys. Lett., 1994, 64(5): 536~538
[6] B. W. Hakki, T. L. Paoli. Gain spectra in GaAs double-hereostructure injection lasers[J]. J. Appl. Phys., 1975, 46(3): 1299~1306
[7] Paul. J. Brannon. Improvedmethod of measuring optical waveguide propagation losses[J]. Appl. Opt., 1986, 25(20): 3596~3597
[8] Roberta Ramponi, Roberto Osellame, Marco Marangoni. Two straightforward methods for the measurement of optical losses in planar waveguides [J]. Rev. Sci. Instrum., 2002, 73(3): 1117~1120
[9] G. Tittelbach, B. Richter, W. Karthe. Comparison of three transmission methods for integrated optical waveguide propagation loss measurement[J]. Pure Appl. Opt., 1993, 2(6): 683~706
[10] Y. Okamura, S. Yoshinaka, S. Yamamoto. Measuring mode propagation losses of integrated optical waveguides: a simple method[J]. Appl. Opt., 1983, 22(23): 3892~3894
[11] R. K. Hickernell, D. R. Larson, R. J. Phelan et al.. Waveguide loss measurement using photothermal deflection[J]. Appl. Opt., 1988, 27(13): 2636~2638
[12] C. Teng. Precision measurements of the optical attenuation profile along the propagation path in thin-film waveguides[J]. Appl. Opt., 1993, 32(7): 1051~1054
[13] A. Boudrioua, J. C. Loulergue. New approach for loss measurements in optical planar waveguides[J]. Opt. Commun., 1997, 137(3): 37~40
[14] Daniel Hofstetter, Robert L.Thornton. Loss measurements on semiconductor lasers by Fourier analysis of the emission spectra[J]. Appl. Phys. Lett., 1998, 72(4): 404~406
[15] Larry A. Coldren, Scoot W.Corzine. Diode Lasers and Photonic Integrated Circuits[M]. Shi Hanxing Transl.. Beijing: Beijing University of Posts and Telecommunications Press, 2006. 50
[16] W. H. Guo, Q. Y. Lu, Y. Z. Huang et al.. Fourier series expansion method for gain measurement from amplified spontaneous emission spectra of Fabry-Pérot semiconductor lasers [J]. IEEE J. Quantum Electron., 2004, 40(2): 123~129
[17] W. H. Guo, D. Byrne, Q. Y. Lu et al.. Waveguide loss measurement using the reflection spectrum [J]. IEEE Photon. Technol. Lett., 2008, 20(16): 1423~1425
[18] J. Lousteau, D. Furniss, A. Seddon et al.. The single-mode condition for silicon-on-insul-ator optical rib waveguides with large cross section[J]. J. Lightw. Technol., 2004, 22(8): 1923~1929
[19] Haisheng Rong, Shengbo Xu, Ying-hao Kuo et al. Low-threshold continuous-wave Raman silicon laser[J]. Nature Photon., 2007, 1(4): 232~237
[20] U. Fischer, T. Zinke, J.-R. Kropp et al.. 0.1 dB/cm waveguide losses in single-mode SOI Rib waveguides[J]. IEEE Photon. Technol. Lett., 1996, 8(5): 647~648
[21] Daniel Pergande, Ralf B. Wehrspohn. Losses and group index dispersion in insulator-on-silicon-on-insulator ridge waveguides[J]. Opt. Express, 2010, 18(5): 4590~4600
[22] K. K. Lee, D. R. Lim, H.-C. Luan et al.. Effect of size and roughness on light transmissi-on in a Si/SiO2 waveguide: experiments and model [J]. Appl. Phys. Lett., 2000, 77: 1617~1619
[23] K. K. Lee, D. R. Lim, L.C. Kimerling et al.. Fabrication of ultralow-loss Si/SiO2 waveguides by roughness reduction[J]. Opt. Lett., 2001, 26(23): 1888~1890
[24] L. K. Rowe, M. Elsey, N. G. Tarr et al.. CMOS-compatible optical rib waveguides defined by local oxidation of silicon[J]. Electron. Lett., 2007, 43(7): 392~393
[25] D. K. Sparacin, S. J. Spector, L. C. Kimerling. Silicon waveguide sidewall smoothing by wet chemical oxidation[J]. J. Lightw. Technol., 2005, 23(8): 2455~2461