In the nanostructures fabrication technologies,atom lithography has particular advantages. In order to satisfy the requirements of fabrication of nanometer scale structure,we designed an experimental setup for chromium atomic lithography and analysed the chromium atomic sources,laser system,frequency stabilization system,atom beam collimation system and the deposition results. The frequency stabilization precision reach to 0.26 MHz. By laser cooling,the divergence of the chromium atomic beam was reduced from 4.5 mrad to 0.9 mrad. The resulting nanolines exhibit a period of 234 nm with height of 0.276 nm.