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    Journals >Chinese Journal of Lasers >Volume 51 >Issue 7 >Page 0701012 > Article
    • Chinese Journal of Lasers
    • Vol. 51, Issue 7, 0701012 (2024)
    Laser‑Induced Discharge Plasma Extreme Ultraviolet Source
    Junwu Wang1, Hongwen Xuan1,3,*, Xinbing Wang2, and Vassily S. Zakharov4
    Author Affiliations
  • 1GBA Branch of Aerospace Information Research Institute, Chinese Academy of Sciences, Guangzhou 510530, Guangdong, China
  • 2Wuhan National Laboratory for Optoelectronics, Wuhan 430074, Hubei, China
  • 3University of Chinese Academy of Sciences, Beijing 100049, China
  • 4Kurchatov Institute,National Research Center, Moscow 125047, Russia
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    DOI: 10.3788/CJL231488 Cite this Article Set citation alerts
    Junwu Wang, Hongwen Xuan, Xinbing Wang, Vassily S. Zakharov. Laser‑Induced Discharge Plasma Extreme Ultraviolet Source[J]. Chinese Journal of Lasers, 2024, 51(7): 0701012 Copy Citation Text show less
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    Article index updated: Jun. 16, 2025
    The article is cited by 3 article(s) CLP online library. (Some content might be in Chinese.)
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    Junwu Wang, Hongwen Xuan, Xinbing Wang, Vassily S. Zakharov. Laser‑Induced Discharge Plasma Extreme Ultraviolet Source[J]. Chinese Journal of Lasers, 2024, 51(7): 0701012
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    Paper Information
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