Researching | Controllable growth of wafer-scale PdS and PdS2 nanofilms via chemical vapor deposition combined with an electron beam evaporation technique

Journals >Journal of Semiconductors >Volume 44 >Issue 12 >Page 122001 > Article

Journal of Semiconductors
Vol. 44, Issue 12, 122001 (2023)

Controllable growth of wafer-scale PdS and PdS₂ nanofilms via chemical vapor deposition combined with an electron beam evaporation technique

Hui Gao¹, Hongyi Zhou¹, Yulong Hao², Guoliang Zhou³, Huan Zhou¹, Fenglin Gao¹, Jinbiao Xiao¹, Pinghua Tang¹, and Guolin Hao^1、4、*

Author Affiliations

¹School of Physics and Optoelectronics and Hunan Institute of Advanced Sensing and Information Technology, Xiangtan University, Xiangtan 411105, China

²College of Physics and Technology & Guangxi Key Laboratory of Nuclear Physics and Technology, Guangxi Normal University, Guilin 541004, China

³Department of Electronic and Electrical Engineering, University of Sheffield, Sheffield S10 2TN, UK

⁴National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210093, China

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DOI: 10.1088/1674-4926/44/12/122001 Cite this Article

Hui Gao, Hongyi Zhou, Yulong Hao, Guoliang Zhou, Huan Zhou, Fenglin Gao, Jinbiao Xiao, Pinghua Tang, Guolin Hao. Controllable growth of wafer-scale PdS and PdS₂ nanofilms via chemical vapor deposition combined with an electron beam evaporation technique[J]. Journal of Semiconductors, 2023, 44(12): 122001 Copy Citation Text

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References

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Hui Gao, Hongyi Zhou, Yulong Hao, Guoliang Zhou, Huan Zhou, Fenglin Gao, Jinbiao Xiao, Pinghua Tang, Guolin Hao. Controllable growth of wafer-scale PdS and PdS₂ nanofilms via chemical vapor deposition combined with an electron beam evaporation technique[J]. Journal of Semiconductors, 2023, 44(12): 122001

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