• Journal of Infrared and Millimeter Waves
  • Vol. 23, Issue 1, 1 (2004)
[in Chinese]1, [in Chinese]1, [in Chinese]2, [in Chinese]2, and [in Chinese]2
Author Affiliations
  • 1Dept. of physics Kunsan National University.68 Miryong, Kunsan 573-701, Korea
  • 2[in Chinese]
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    DOI: Cite this Article
    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. MICROSTRUCTURE OF CdSFILMS PREPARED WITH CHEMICAL PYROLYSIS DEPOSITION[J]. Journal of Infrared and Millimeter Waves, 2004, 23(1): 1 Copy Citation Text show less
    References

    [1] Ebothe J. Dependence of the sprayed CdS photoelectrode behavior upon the pyrolysis atmosphere[J]. SPIE; 1988; 1016: 84-88

    [2] Ullrich B; Sakai H; Segawa Y. Optoelectronic properties of thin film CdS formed by ultraviolet and infrared pulsed-laser deposition[J]. Thin Solid Films; 2001; 385: 220-224

    [3] Dzhafarov T D; Altunbas M; Kopya A I; et al. Formation of P-type CdS thin films by laser-stimulated copper diffusion[J]. J.Phys D; 1999; 32: L125-128

    [4] Oumous H; Hadiri H. Optical and electrical properties of annealed CdS thin films obtained from a chemical solution[J]. Thin Solid Films; 2001; 386: 87-90

    [5] Pavaskar N R; Menezes C A; Sinha A P B. Photoconductive CdS films by a chemical bath deposition process[J]. J.Electrochem.Soc.; 124: 743-748

    [6] Ichimura M; Goto F; Arai E. Structural and optical characterization of CdS films grown by photochemical deposition[J]. J.Appl.Phys.;1999; 85: 7411-7417

    [8] Cullity B D. Elements of x-ray diffraction 2nd ed.[M]. USA: Addison-Wesley Pub.Company; 1978

    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. MICROSTRUCTURE OF CdSFILMS PREPARED WITH CHEMICAL PYROLYSIS DEPOSITION[J]. Journal of Infrared and Millimeter Waves, 2004, 23(1): 1
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