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    Journals >Acta Optica Sinica >Volume 35 >Issue 11 >Page 1111002 > Article
    • Acta Optica Sinica
    • Vol. 35, Issue 11, 1111002 (2015)
    Illumination Mode Conversion System Design Based on Micromirror Array in Lithography
    Xing Shasha*, Ran Yinghua, Jiang Haibo, and Xing Tingwen
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    DOI: 10.3788/aos201535.1111002 Cite this Article Set citation alerts
    Xing Shasha, Ran Yinghua, Jiang Haibo, Xing Tingwen. Illumination Mode Conversion System Design Based on Micromirror Array in Lithography[J]. Acta Optica Sinica, 2015, 35(11): 1111002 Copy Citation Text show less
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    Xing Shasha, Ran Yinghua, Jiang Haibo, Xing Tingwen. Illumination Mode Conversion System Design Based on Micromirror Array in Lithography[J]. Acta Optica Sinica, 2015, 35(11): 1111002
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