• Infrared and Laser Engineering
  • Vol. 49, Issue 9, 20200169 (2020)
Meixuan Li1、2, Siqi Zhang1、2, Hong Li1、2, Nan Li1、2, Yuxuan Ren3, and Jialong Tian3
Author Affiliations
  • 1Institute for Interdisciplinary Quantum Information Technology, Jilin Engineering Normal University, Changchun 130052, China
  • 2Jilin Engineering Laboratory for Quantum Information Technology, Changchun 130052, China
  • 3Faculty of Applied Sciences, Jilin Engineering Normal University, Changchun 130052, China
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    DOI: 10.3788/IRLA20200169 Cite this Article
    Meixuan Li, Siqi Zhang, Hong Li, Nan Li, Yuxuan Ren, Jialong Tian. Research on the bandpass filter used for single-exposure multi-spectral ghost imaging system[J]. Infrared and Laser Engineering, 2020, 49(9): 20200169 Copy Citation Text show less
    Structure of single-exposure multi-spectral intensity correlation imaging system
    Fig. 1. Structure of single-exposure multi-spectral intensity correlation imaging system
    Theoretical design curve of a thin film device in a single-exposure multispectral correlation imaging system
    Fig. 2. Theoretical design curve of a thin film device in a single-exposure multispectral correlation imaging system
    Three-dimensional morphology of SiO2 films with different deposition rates
    Fig. 3. Three-dimensional morphology of SiO2 films with different deposition rates
    Material optical constants
    Fig. 4. Material optical constants
    Comparison chart of spectral test curve and design curve
    Fig. 5. Comparison chart of spectral test curve and design curve
    Residual vapor deposition of each film layer
    Fig. 6. Residual vapor deposition of each film layer
    Comparison of residual evaporation before and after modification
    Fig. 7. Comparison of residual evaporation before and after modification
    Fitting curve of Nb2O5 and SiO2 film thickness and residual evaporation
    Fig. 8. Fitting curve of Nb2O5 and SiO2 film thickness and residual evaporation
    Band pass filter transmittance test curve
    Fig. 9. Band pass filter transmittance test curve
    ParameterSpecification
    SubstrateBK7
    Incident angle/(°)0-30
    Spectrum range/nm350-440450-700710-800
    Transmittance<0.5%≥98%<0.5%
    Table 1.

    Technical parameter

    技术参数

    Surface roughnessDeposition rates
    0.5 nm/s0.7 nm/s0.9 nm/s
    Sa/μm 0.002 20.001 20.001 7
    Sq/μm 0.002 30.001 20.002 1
    Sz/μm 0.059 00.026 30.136 3
    Table 2.

    Surface roughness of UV-SiO2 film at different deposition rates

    不同沉积速率UV-SiO2薄膜表面粗糙度

    MaterialSubstrate temperature/℃Degree of vacuum/PaDeposition rate/(nm·s−1) Flow rate of O2/sccm
    KaufmanHPE
    SiO21801.0×10−30.750
    Nb2O51801.0×10−30.53515
    Table 3.

    Deposition process parameters of Nb2O5 and UV-SiO2

    Nb2O5和UV-SiO2沉积工艺参数

    Meixuan Li, Siqi Zhang, Hong Li, Nan Li, Yuxuan Ren, Jialong Tian. Research on the bandpass filter used for single-exposure multi-spectral ghost imaging system[J]. Infrared and Laser Engineering, 2020, 49(9): 20200169
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