• Journal of Infrared and Millimeter Waves
  • Vol. 30, Issue 3, 202 (2011)
DAI Ye*, HE Min, YAN XiaoNa, and MA GuoHong
Author Affiliations
  • [in Chinese]
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    DOI: Cite this Article
    DAI Ye, HE Min, YAN XiaoNa, MA GuoHong. Crystallization of amorphous silicon film induced by a nearinfrared femtosecond laser[J]. Journal of Infrared and Millimeter Waves, 2011, 30(3): 202 Copy Citation Text show less
    References

    [1] HER T, FINLAY R, WU C, et al, Microstructuring of silicon with femtosecond laser pulses[J]. Applied Physics Letters,1998,73(12):1673—1675.

    [3] MIURA K, QIU J, MITSUYU T, et al. Spaceselective growth of frequencyconversion crystals in glasses with ultrashort infrared laser pulses[J]. Optics Letters,2000,25(6):408—410.

    [4] DAI Y, ZHU B, QIU J, et al. Direct writing threedimensional Ba2TiSi2O8 crystalline pattern in glass with ultrashort pulse laser[J]. Applied Physics Letters,2007,90(18):181109—1/3.

    [5] CHOI T, HUANG D, GRIGOROPOULOS C, Ultrafast laserinduced crystallization of amorphous silicon films[J]. Optical Engineering,2003,43(11):3383—3388.

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    [9] NAYAK B, EATON B, SELVAN J, et al. Semiconductor laser crystallization of aSi: H on conducting tinoxidecoated glass for solar cell and display application[J]. Applied Physics A,2005,80(5):1077—1080.

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    [12] MURAKAMI K, ERYU O, TAKITA K, et al. Explosive crystallization starting from an amorphoussilicon surface region during longpulse laser irradiation[J]. Physical Review Letters,1987,59(19):2203—2206.

    DAI Ye, HE Min, YAN XiaoNa, MA GuoHong. Crystallization of amorphous silicon film induced by a nearinfrared femtosecond laser[J]. Journal of Infrared and Millimeter Waves, 2011, 30(3): 202
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