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    Journals >Acta Optica Sinica >Volume 36 >Issue 10 >Page 1012002 > Article
    • Acta Optica Sinica
    • Vol. 36, Issue 10, 1012002 (2016)
    Measurement of Wavefront Aberration of Extreme Ultraviolet Lithographic Projection Lens Based on Ptychography
    Fang Wei1、2、*, Tang Feng1, Wang Xiangzhao1、2, Zhu Penghui1、2, Li Jie1、2, Meng Zejiang1、2, and Zhang Heng1、2
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  • 2[in Chinese]
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    DOI: 10.3788/aos201636.1012002 Cite this Article Set citation alerts
    Fang Wei, Tang Feng, Wang Xiangzhao, Zhu Penghui, Li Jie, Meng Zejiang, Zhang Heng. Measurement of Wavefront Aberration of Extreme Ultraviolet Lithographic Projection Lens Based on Ptychography[J]. Acta Optica Sinica, 2016, 36(10): 1012002 Copy Citation Text show less
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    Fang Wei, Tang Feng, Wang Xiangzhao, Zhu Penghui, Li Jie, Meng Zejiang, Zhang Heng. Measurement of Wavefront Aberration of Extreme Ultraviolet Lithographic Projection Lens Based on Ptychography[J]. Acta Optica Sinica, 2016, 36(10): 1012002
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